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Hydrogen氢气

H₂ · CAS 1333-74-0 · UN 1049

High-purity hydrogen — reducing gas and carrier gas for semiconductor industry, raw material for hydrogenation reaction in petrochemical and metallurgical industry.高纯氢气——半导体行业还原气、载气,石油化工、金属冶炼加氢反应原料。

Chemical Formula化学式H₂
CAS NumberCAS 号1333-74-0
UN NumberUN 编号UN 1049
Boiling Point (1 atm)沸点(1 atm)−252.8 °C
Packaging包装47L/50L steel cylinders
Purity Grade纯度等级≥99.999%

Product Quality Index产品质量指标

Hydrogen Concentration(Volume Fraction)氢气浓度(体积分数)≥99.999%
Oxygen Content(Volume Fraction, ppm)氧含量(体积分数,ppm)≤1
Argon Content(Volume Fraction, ppm)氩含量(体积分数,ppm)To be agreed by supplier and buyer
Nitrogen Content(Volume Fraction, ppm)氮含量(体积分数,ppm)≤5
Carbon Monoxide Content(Volume Fraction, ppm)一氧化碳含量(体积分数,ppm)≤1
Carbon Dioxide Content(Volume Fraction, ppm)二氧化碳含量(体积分数,ppm)≤1
Methane Content(Volume Fraction, ppm)甲烷含量(体积分数,ppm)≤1
Water Content(Volume Fraction, ppm)水含量(体积分数,ppm)≤3
Total Impurity Content(Volume Fraction, ppm)杂质总含量(体积分数,ppm)≤10

Physical Property物理性质

Component成分Hydrogen氢气
Appearance and Character外观和性状Colorless, odorless, tasteless gas无色、无臭、无味气体
Melting Point (℃)熔点(℃)−259.14 ℃
Boiling Point (℃)沸点(℃)−252.8 ℃
Relative Density (water=1)相对密度(水=1)0.07(−252.8 ℃)
Relative Vapor Density (air=1)相对蒸气密度(空气=1)0.07(−252.8 ℃)
Saturated Vapor Pressure饱和蒸汽压 13.33 kPa (-257.9 ℃) 13.33千帕(-257.9 ℃)
Combustion Heat(kJ/mol)燃烧热(kJ/mol)-241
Critical Temperature (℃)临界温度(℃)−240 ℃
Critical Pressure (MPa)临界压力(MPa)1.30 MPa
Ignition Temperature (℃)引燃温度(℃)500 ~ 571.2 ℃
Upper Explosion Limit (%v/v)爆炸上限%(v/v)7.5
Lower Explosion Limit (%v/v)爆炸下限%(v/v)4.1
Solubility溶解度Insoluble in water, slightly soluble in ethanol and ether不溶于水,微溶于乙醇、乙醚

Main Use主要用途

Application用途Electronics & Semiconductor: used as reducing gas and carrier gas for semiconductor epitaxy, CVD and other processes. Petrochemical: raw material for hydrocracking, hydrofining and other hydrogenation reactions. Metallurgy: protective gas for anti-oxidation and reducing agent for metal powder. Scientific Research: carrier gas for gas chromatography, gas source for NMR and other high-end analytical instruments.电子半导体:用作还原气、载气,半导体外延、化学气相沉积(CVD)等工艺气体。石油化工:加氢裂化、加氢精制等加氢工艺反应原料。金属冶炼:用作防止氧化的保护气,以及金属粉末的还原剂。科学研究:实验室气相色谱载气、核磁共振仪等高端分析仪器气源。

Packing Specification包装规格

Package包装47L/50L cylinders47L/50L气瓶